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The diffusion redistribution of hydrogen and oxygen in porous silicon films

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dc.contributor.authorDzhafarov, TD
dc.contributor.authorCan, B
dc.contributor.institutionauthorCAN ÖMÜR, Birsel
dc.date.accessioned2026-06-27T12:59:33Z
dc.date.issued2000
dc.description.urihttps://doi.org/10.1023/a:1006746226563
dc.identifier.doi10.1023/a:1006746226563
dc.identifier.endpage289
dc.identifier.issn0261-8028
dc.identifier.issue4
dc.identifier.startpage287
dc.identifier.urihttps://hdl.handle.net/20.500.14981/48680
dc.identifier.volume19
dc.identifier.wos000085480200006
dc.language.isoeng
dc.publisherKLUWER ACADEMIC PUBL
dc.relation.ispartofJOURNAL OF MATERIALS SCIENCE LETTERS
dc.subjectOXIDATION
dc.subjectMaterials Science
dc.titleThe diffusion redistribution of hydrogen and oxygen in porous silicon films
dc.typeArticle
dspace.entity.typePublication
local.import.sourceWOS

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