Yayın:
MODELLING OF ELECTRODEPOSITION BATH USING THE FLOW ANALYSIS TECHNIQUE

dc.contributor.authorBudak, T. B.
dc.contributor.authorKoyuncu, I.
dc.contributor.authorAkcin, G.
dc.contributor.authorAfsar, H.
dc.contributor.institutionauthorKOYUNCU, İkbal
dc.date.accessioned2026-06-27T13:06:00Z
dc.date.issued2009
dc.description.abstractThis study aims to develop coating quality by using Flow Analysis (FA) technique in acid copper coating bath. The coating metal concentration of electrodeposition bath mixture, current density, coating time, distance between anode and cathode, temperature of bath mixture and pH are some of the factors which affect the coating quality. The coating metal concentration is the most important parameter. The metal concentration of electroplating bath solution decreases during the coating so coating quality also decreases. Bath mixture composition has been determined by analysing samples periodically according to the conventional industrial application. Much more time, effort and high financial cost are very necessary for this type of analysis. This paper represents a new method which determines the metal concentration of coating baths with flow analysis technique. The metal concentration is measured on-line with spectrophotometric technique which includes flow through cell according to the new method. This technique is very simple and the results can be taken easily. Firstly, the decrease in metal concentration is determined by the batch technique and then a sufficient amount of stock metal solution is added to the plating bath continuously by on-line system. The metal concentration of coating bath solution is kept at constant concentrations. This means that the coating metal quality does not decrease. All data are examined statistically. After reaching optimum conditions, coating results are examined by using Faraday Laws.en
dc.identifier.eissn2191-0189
dc.identifier.endpage9
dc.identifier.issn0793-0135
dc.identifier.issue1
dc.identifier.startpage1
dc.identifier.urihttps://hdl.handle.net/20.500.14981/49711
dc.identifier.volume28
dc.identifier.wos000265163100001
dc.language.isoeng
dc.publisherWALTER DE GRUYTER GMBH
dc.relation.ispartofREVIEWS IN ANALYTICAL CHEMISTRY
dc.subjectCopper (II)
dc.subjectElectroplating
dc.subjectCurrent Density
dc.subjectOn-Line
dc.subjectElectrodeposition
dc.subjectFlow Through Cell
dc.subjectINJECTION ANALYSIS
dc.subjectChemistry
dc.titleMODELLING OF ELECTRODEPOSITION BATH USING THE FLOW ANALYSIS TECHNIQUE
dc.typeArticle
dspace.entity.typePublication
local.import.sourceWOS

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