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Formation of p-type CdS thin films by laser-stimulated copper diffusion

dc.contributor.authorDzhafarov, TD
dc.contributor.authorAltunbas, M
dc.contributor.authorKopya, AI
dc.contributor.authorNovruzov, V
dc.contributor.authorBacaksiz, E
dc.date.accessioned2026-06-27T12:59:46Z
dc.date.issued1999
dc.description.abstractA new fabrication technique of p-type CdS thin films by He-Ne laser illumination of bilayer Cu-nCdS structures at room temperature was investigated. The n-type CdS films were obtained by vacuum evaporation in a quasi-closed volume. X-ray diffraction was used to provide crystalline structure and composition data of CdS films and Cu-CdS structures. The band gap of CdS films was estimated from the optical transmission spectra. The hot probe and Hall effect studies were used for the determination of conductivity type and concentration of charge carriers in films. The formation of a p-n homojunction in CdS films or conversion of the film all over to the p-type, depending on the duration of laser illumination, was shown by I-V characteristics, the photovoltaic, the hot probe and Hall effect measurements. Analysis of concentration distributions of Cu in CdS films, arising as a result of laser-accelerated diffusion, by energy dispersive x-ray spectroscopy gave the effective diffusion coefficient of copper, D = 8 x 10(-12) cm(2) s(-1) at T = 25 degrees C.en
dc.description.urihttps://doi.org/10.1088/0022-3727/32/24/101
dc.identifier.doi10.1088/0022-3727/32/24/101
dc.identifier.endpageL128
dc.identifier.issn0022-3727
dc.identifier.issue24
dc.identifier.startpageL125
dc.identifier.urihttps://hdl.handle.net/20.500.14981/48732
dc.identifier.volume32
dc.identifier.wos000084678200001
dc.language.isoeng
dc.publisherIOP PUBLISHING LTD
dc.relation.ispartofJOURNAL OF PHYSICS D-APPLIED PHYSICS
dc.subjectCELLS
dc.subjectPhysics
dc.titleFormation of p-type CdS thin films by laser-stimulated copper diffusion
dc.typeArticle
dspace.entity.typePublication
local.import.sourceWOS

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